Website URL : http://teasystems.com/

Website Title : TEA Systems - Semiconductor Data modeling for process control and characterization

Website Description : TEA Systems software for semiconductor process and tool modeling and control using adaptive models.

Keywords Used : MEEF, EOL, End-of-Line, end of line, RET, OPC, Phase Shift, qualification, validation, Reticle Enhancement, Wafer, semiconductor, IC,field, stepper, exposure, scanner, ASML, CANON, NIKON, metrology, model, modeling, contour, substrate, reticle, control, process control, APC, regression, wafer map, wafer contour, field contour, CD contour, critical dimension, tilt, bow, focus, PEB, Post Exposure Bake, PW, PWA, Process Window, Depth of Focus, best focus, Never a charge for new import formats! TEA Products import all formats including KLA-Tencore, Accent, Bio-Rad, Hitachi, IVS, Soluris, Schlumberger, Nanometrics, CDE ResMap, Ellispometer, NIKON, CANON, ASML, ThermoWave, NOVA, TEA, TEL, Timbre, TEL, Sensarray, OnWafer, Excel and others. Overlay, Registration, Feature Profiles, CD, Film Thickness, Temperature, Electrical Test, Faraday, Kelvin Structures, Simulator, calibration, OPC, TEL, RET